Other articles related with "flow rate":
18902 Bo-Si Zhang(张博思), Zhi-Hong Yu(余志红), Bo-Lin Sun(孙柏林), Zi-Yu Guo(郭紫钰), and Mo Chen(陈默)
  Pedestrian flow through exit: Study focused on evacuation pattern
    Chin. Phys. B   2024 Vol.33 (1): 18902-18902 [Abstract] (74) [HTML 0 KB] [PDF 2856 KB] (16)
64702 Qing-Qing Gao(高庆庆), Yu-Chao Chen(陈玉超), and Lin Hu(胡林)
  Effect of particle shape on packing fraction and velocity profiles at outlet of a silo
    Chin. Phys. B   2023 Vol.32 (6): 64702-064702 [Abstract] (176) [HTML 0 KB] [PDF 1825 KB] (60)
44502 Xin Wang(王欣), Hong-Wei Zhu(朱红伟), Qing-Fan Shi(史庆藩), Ning Zheng(郑宁)
  Discharge flow of granular particles through an orifice on a horizontal hopper: Effect of the hopper angle
    Chin. Phys. B   2020 Vol.29 (4): 44502-044502 [Abstract] (588) [HTML 1 KB] [PDF 1145 KB] (136)
67901 Rongxuan Deng(邓荣轩), Haoran Zhang(张浩然), Yanhui Zhang(张燕辉), Zhiying Chen(陈志蓥), Yanping Sui(隋妍萍), Xiaoming Ge(葛晓明), Yijian Liang(梁逸俭), Shike Hu(胡诗珂), Guanghui Yu(于广辉), Da Jiang(姜达)
  Graphene/Mo2C heterostructure directly grown by chemical vapor deposition
    Chin. Phys. B   2017 Vol.26 (6): 67901-067901 [Abstract] (754) [HTML 1 KB] [PDF 1423 KB] (484)
48102 Zhang Lin (张林), Ma Guo-Jia (马国佳), Lin Guo-Qiang (林国强), Ma He (马贺), Han Ke-Chang (韩克昌)
  Influences of nitrogen flow rate on the structures and properties of Ti and N co-doped diamond-like carbon films deposited by arc ion plating
    Chin. Phys. B   2014 Vol.23 (4): 48102-048102 [Abstract] (641) [HTML 1 KB] [PDF 555 KB] (350)
3563 Han Xiao-Yan(韩晓艳), Hou Guo-Fu(侯国付), Zhang Xiao-Dan(张晓丹), Wei Chang-Chun(魏长春), Li Gui-Jun(李贵君), Zhang De-Kun(张德坤), Chen Xin-Liang(陈新亮), Sun Jian(孙健), Zhang Jian-Jun(张建军), Zhao Ying(赵颖), and Geng Xin-Hua(耿新华)
  Influence of the total gas flow rate on high rate growth microcrystalline silicon films and solar cells
    Chin. Phys. B   2009 Vol.18 (8): 3563-3567 [Abstract] (1138) [HTML 1 KB] [PDF 287 KB] (570)
1110 Gao Yan-Tao (高艳涛), Zhang Xiao-Dan (张晓丹), Zhao Ying (赵颖), Sun Jian (孙健), Zhu Feng (朱峰), Wei Chang-Chun (魏长春), Chen Fei (陈飞)
  Influence of total gas flow rate on microcrystalline silicon films prepared by VHF-PECVD
    Chin. Phys. B   2006 Vol.15 (5): 1110-1113 [Abstract] (1418) [HTML 1 KB] [PDF 266 KB] (683)
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